The objective of Center of Nanosynergy laboratory is to create the modern laboratory with well-developed infrastructure, conducting relevant research, technology transfer and commercialization.
The main strategy goal of Nanosynergy laboratory is to create the Nanotechnology Center in the next 3-4 years, equipping it with modern facilities and hiring 10-20 highly qualified specialists for the Center.
Create 5 new laboratories as part of the Center: ALD, Cluster technology, Nanobiology of plant, Physics and Chemistry of nanomaterials and finally Plasma technology; as well as Theoretical department with high-speed simulation.
Develop cooperation with Argonne National Laboratory and with universities of Kyoto, Hyogo, Purdue, MIT, Berkeley, Ben-Gurion, Humboldt, and Urbana-Champaign.
Nanoporous and nanolayered materials
Study the relationship of crystal and electronic structure- synthesis –characterization- properties - application. Study the possibility of deposition of nanoscale layers of different chemical nature on the samples prepared with different grist. For this, group has a new device ALD (USA), which allows implementation such work.
The purpose of this task is to obtain high quality large area graphene, as current well-known methods have technological restrictions. For example, the formation of polycrystalline structures consisting of mutually deployed small (about 20-30 nm) fragments of alternating sections of monolayer single-crystal graphene and multilayer graphene-like films with a mosaic structure.
The second objective is to make a controlled pore with diameters 2 - 10 nm on the graphene surface. Until now, there are no methods for creation nanomembranes with the controlled pore. For creation such graphene nanomembranes radiation method is very promising, which makes tracks by using of cluster beams gas molecules.
Accelerator Complex GCIB
The technology of irradiation by beams of gas - cluster ions is a new and unique method of surface treatment. Irradiation by ion beams of gas cluster allows modifying and controlling the properties of the surface such as nanoscale texturing, hydrophilicity and crystallinity of the surface.
In this project, GCIB will be used as a new material irradiation technology, which will be used to create ecological filters. The particles of salts will separate, due to the formation nanopores with controlled size as a consequence of this irradiation. Dimensions of nanopores depend on the given radiation dose.
Atomic Layer Deposition (Atomic Layer Deposition - ALD) is a thin-film technology that allows deposition of thin film virtually on any substrate with any shape. ALD is currently used in the semiconductor industry for mass production of microprocessors, hard drives, and memory chips. We propose to extend this technology for producing new functional coatings for various applications in nanoelectronics, nanomedicine and membranes. Successful deployment of ALD technology and GCIB will allow rising Kazakhstan science to a new level.
We suppose to use advanced computational methods to predict the structure-property relationship for nanoscale materials to create new advanced materials. Numerical simulations will perform on supercomputers by using molecular dynamics, density functional theory, Monte Carlo, finite elements methods and etc.